- High Quality and High Purity Hydrogen Peroxide (35%), the metal impurity content: mas 0.1ppb
- Suppress the adsorption phenomenon to the wafer surface of the metal impurities in the cleaning solution
|Product Name||Features||Application examples|
|HIRINPER-SP||High purity grade
Effectively suppresses the adsorption and contamination of impurity metal ions
|For RCA cleaning soln.
It is possible to remove the particles and metal impurities by one-step cleaning in the RCA (APM) soln. according to the present soln.
- HIRINPER-SP: 200kg-filled drum
Related laws and regulations