High Quality Hydrogen Peroxide

Characteristics

Semiconductors
  • High Quality and High Purity Hydrogen Peroxide (35%), the metal impurity content: mas 0.1ppb
  • Suppress the adsorption phenomenon to the wafer surface of the metal impurities in the cleaning solution
Product Name Features Application examples
HIRINPER-SP High purity grade
Effectively suppresses the adsorption and contamination of impurity metal ions
For RCA cleaning soln.
It is possible to remove the particles and metal impurities by one-step cleaning in the RCA (APM) soln. according to the present soln.

Packaging

  • HIRINPER-SP: 200kg-filled drum

Related laws and regulations

TSCA -
EINECS -

Application

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